Steph,

I'm a little confused.  Are you saying that dry-film is almost universal
for MEMS patterning?  I really have not observed anything to this
effect.  In fact, most of the MEMS customers I am aware of are either
using spin coating processes, or in many cases over the last couple of
years, have been migrating to Spray Coating in order to handle the high
topographies found in MEMS devices.

Best Regards,
Chad Brubaker


-----Original Message-----
From: steph champ
Sent: Friday, November 04, 2005 10:18 AM
To: [email protected]
Subject: [mems-talk] Small survey about photolithography applied to MEMS
anddry-film photoresists ??

What particular attributes of photolithography result in this process
being
used
almost universally to fabricate silicon MEMS devices?


When might dry-film photoresists be used advantageously in MEMS
fabrication?