> Sent: zondag 20 november 2005 2:18
> Subject: [mems-talk] Wet Etchant for silicon nitride
>
> Concentrated HF is the only etchant I know that removes
> silicon nitride without much damage to silicon.  However conc
> HF is much too slow.  Is there an etchant that removes
> nitride quickly but does not harm silicon?

Hot phosphoric acid should do the trick.

http://snf.stanford.edu/Equipment/wbgeneral/NitrideEtchWBGen.html

Cheers,
\Geert.