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MEMSnet Home: MEMS-Talk: SU-8 mold for Au electroplating : SU-8 is not developedwell
SU-8 mold for Au electroplating : SU-8 is not developed well
2005-12-19
aeroalto
SU-8 mold for Au electroplating : SU-8 is not developedwell
2005-12-19
Richard H. Morrison
2005-12-20
Lung-hao Hu
SU-8 mold for Au electroplating : SU-8 is not developedwell
Richard H. Morrison
2005-12-19
Hello,

Try to develop in an ultrasonic cleaner. That means you place the developer in a
beaker, place the beaker in the ultrasonic cleaner and develop for 2 minutes
that should open the small vias.

Rick Morrison

Rick Morrison
Senior Member of the Technical Staff
The Charles Stark Draper Laboratory
MS-80
555 Technology Square
Cambridge, MA   02139-3563
617-258-3420
[email protected]


-----Original Message-----
From: [email protected] [mailto:[email protected]] On
Behalf Of aeroalto
Sent: Sunday, December 18, 2005 10:24 PM
To: [email protected]
Subject: [mems-talk] SU-8 mold for Au electroplating : SU-8 is not developedwell

Hi

I'm using SU-8 2050.
I make 50um thick SU-8 layer on Au seed layer and open vias 12um diameter in
SU-8 for electroplating Au, using SU-8 as mold.
Electroplating is unsuccessful because not all SU-8 is removed from seed layer.

My process detail is like following.
Pre-baking :  20 degree C (room temp.)->ramp up to 65C with 3C/min->stay 3 min
in 65C-> ramp up to 95C with 3C/min -> stay 9 min in 95C
==>         ->ramp down to 65C with -3C/min -> stay 10 min in 65C
==>         ->ramp down to room temp with -1C/min
I've been using 400nm UV light with 10mW/cm^2 intensity, 380mJ/cm^2 dose (about
38 sec exposure).
(We have Quintel Q-4000 mask aligner, so I can use 365nm UV light.) Post-baking
: 20 degree C (room temp.)->ramp up to 65C with 3C/min->stay 1 min in 65C->ramp
up to 95C with 3C/min -> stay 7 min in 95C
==>         ->ramp down to 65C with -3C/min -> stay 10 min in 65C
==>         ->ramp down to room temp with -1C/min
Developing : Agitating in SU-8 developer (microchem)

I tried to increase the developing time and RIE with 100% O2 , 200mTorr, 200W
for several min.
And also tried to dip in acetone for 10 sec.
All these were not working.
Actually I have some bigger features (100umx100um) on the same sample and those
are well developed.
I think I need to have more optimized or experienced values for exposure dose
and baking time.

Any suggestions to remove all SU-8 from Au seed layer?
You guys think 12um Diameter hole (with 50um thick) is ok or too small?
reply
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