Dear Peter
Are you suggesting to evaporate a Cr layer after developing the photoresist and
no hardbake?
Don't you think it could be a problem of the type of photoresist?






Dear Barbara,

Try to use a metal mask e.g. Cr.
After patterneing the Cr layer don't remove the resit befor BHF etching..

regards,
Peter Kuijpers
Philips





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     "Barbara Cortese"
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                                       [mems-talk] Quartz wet etching
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     2006-12-14 05:10 PM

      Please respond to
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Dear all
I'm wet etching quartz with a BHF solution 6:1, but I have encounterd some
difficulties in etching.
What I do is a photolithographic process on the quartz substrate, a
hardbake of 4 hours at 180° and then the wet etching process.
What I obtain though is the rearrangement of the photoresist in a
disordered pattern and no etching!
Has anyone an idea where I go wrong?
Barbara