Hi All, I'm looking for information from anyone knowledgable or using an all dry
lithography process that utilizes a PECVD deposited film (PPMS), grown from
methylsilane.  Dry developing of the film is done with Cl2 based plasma.  There
are many published papers from the same group from about 1997 to 2003 on the
subject.  This process as described would solve some difficult process issues
for my devices.  I would be exposing this film with 248nm light.

Thank you,

Scott
Rubian Lonestar Inc