Dear members,

I'm trying to structure the SiO2 layer on the Si membrane into 370 um
trenches. The surface to be patterned is 2.0 x 5.0 mm^2.
Do you know any photopolymer conformal coatings for UV (324 nm) lithography?

Ideally this plymer must be PCVD/PECVD or evaporation compatible.

Thank you!
-----------------------------
Dipl.-Ing. Vitali Emelianov

AG Microrobotics
Stiftung caesar
Ludwig-Erhard-Allee 2
53175 Bonn

Tel. +49 (0) 228 9656 342
e-Mail: [email protected]
www.caesar.de/1677.0.html