Low Etch Rate but High Interface Trap Density for PECVD
oxide film?
Chih-Chieh Cheng
2007-10-27
Hi,
We have very quality of good PECVD oxide films (etch rate for HF:DI
water:1:20: 230 A/min) but the trap density is quite poor. We do not
have the quantitative data for the trap density but based on what we
observed from our fabricated MEMS switches. Could anyone please
comment on it?
Thanks
CC
