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MEMSnet Home: MEMS-Talk: Adhesion problem between electroplated Copper and Gold seed layer
Adhesion problem between electroplated Copper and Gold seed layer
2010-01-28
Will Yu
2010-01-28
Fei Wang
2010-01-28
Morrison, Richard H., Jr.
Adhesion problem between electroplated Copper and Gold seed layer
Will Yu
2010-01-28
Hi all,

I was trying to electroplate Cu on gold seed layer by using SU8 as mask.
After plating, all the small Cu patterns were  released when I tried to remove
SU8 in remover PG @ 80C. Is there anyway to improve the adhesion? Does
it help if I evaporate Cu as seed layer or dry etch SU8? Any suggestion
is appreciated.

For dry etching SU8, could anyone provide a recipe with fast etching rate
(my SU8 is about 100um thick)?

Thanks,
Will
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