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MEMSnet Home: MEMS-Talk: patterning sub-micron holes in chromium
patterning sub-micron holes in chromium
2010-02-08
Marc Reinig
2010-02-09
Wendell McCulley
2010-02-09
Daniel Figura
2010-02-09
[email protected]
patterning sub-micron holes in chromium
[email protected]
2010-02-09
I do not think you need such thick Cr (you'll have a difficult aspect
ratio). Photolithographic masks normally have only 100nm of Cr which should
block light quite well. They are wet-etched with e.g. Chrome-Etch No.18
(quite cheap).

Ciao
Daniel

* Dr. Daniel Grimm
* IFW Dresden
*            - Institute for Integrative Nanosciences -
* E-Mail:  [email protected]
* Phone: +49 351 4659-314
* Mobile: +49 177 4926561


-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Marc Reinig
Sent: Montag, 8. Februar 2010 23:19
To: [email protected]
Subject: [mems-talk] patterning sub-micron holes in chromium

I would like to place one to several sub-micron holes in a film of chromium
on a glass slide.  The chromium does not have to be very thick, only enough
to block visible light, a few microns thick I think.

Anyone have a recommendation on methods or any services that can provide
this?

Thanks in advance,

Marco
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