Dear, Everyone,

I have a photolitography mask, that is starting to accumulate stains
of SU-8, from the many times it was in contact with samples.  For
other resists its usually sufficient to rinse the mask in acetone, but
SU-8 is resistant to most solvents after numerous exposures to UV
light. I was thinking of trying an oxygen asher. It seems like that
should be ok, but, just in case, are there are reasons to avoid
exposing such masks to oxygen plasma? The mask is Soda-Lime coated
with Cr.

thank you,
-Mikas