Hello,

I am looking to make a vacuum frame out of a UV transparent material for
contact photolithography. I have read about Teflon AF being used for
pellicles on IC photomasks, but this is not my industry and I have never
worked with the material before. Can I purchase sheets of thicker
material (~200 microns rather than 2 microns generally used for
pellicles), could I cast it myself using a known method, and how
stretchable is this material? It would be nice if the Teflon was quite
stretchy, but it is not entirely necessary that it be stretchy. I am
assuming that it does have some give to it, I was just hoping that it
would be more than say 200 micron thick Mylar, a standard film emulsion
mask.



If anyone can help me out in working with this material, that would be
great.



Sincerely,

David Casale

R&D Engineer

www.maxlevy.com 

Max Levy Autograph

2710 Commerce Way

Philadelphia, PA 19154 USA

tel: 215-842-3675