I am looking for a photoresist that I can use to lift off a silk screened
coating.  Therefore the photoresist needs to be stable to triethylphosphate
(the coating solvent) and be able to be removed after being baked at
180-200C.

Does anyone know of such a resist.

Thank you,
Tina Garyantes
Dr. Tina Garyantes
Merck & Co., RY 50A -200
P.O. Box 2000
Rahway, NJ 07059
(732) 594-4812
[email protected]