Hi Harsh,
I once used 1813 as protection material to protect Al film on silicon
substrate. However, I found that after the 1813 protection layer is put into
49% HF for couple of minutes, it becomes hard to remove this photoresist
layer completely. Do you have such problem when using BOE?
Thanks,
-Li
--
Li. Zhang
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Graduate Student
Edward P. Fitts Department of Industrial and Systems Engineering
North Carolina State University
Raleigh, NC 27695-7906
USA
Web: http://www.ise.ncsu.edu
http://www.nnf.ncsu.edu
