Hi all,

As a part of my project I have deposited 500 micron SiC film strips on
Si/SiO2 wafer. SiO2 wafer is 1 micron thick. Now I want to etch SiO2 so that
I can make a bridge. I have tried to etch SiO2 with concentrated HF for 1.5
hrs but SiO2 layer is still there. Please help me.

Thank You very much,
Priyesh Dhandharia,
M.Tech (Materials Science)
IIT Bombay