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MEMSnet Home: MEMS-Talk: Removing hard-baked photoresist
Removing hard-baked photoresist
2010-06-22
ameya g
2010-06-23
antwi nimo
2010-06-23
Jesse D Fowler
2010-06-24
Jie Zou
2010-06-24
Morrison, Richard H., Jr.
2010-06-25
[email protected]
2010-06-24
Mike Whitson
2010-06-24
Bill Moffat
2010-06-24
Michael D Martin
2010-06-25
ameya g
Removing hard-baked photoresist
Jie Zou
2010-06-24
Holy cow... are you sure this won't explode?

Jie

On Wed, Jun 23, 2010 at 1:26 PM, Jesse D Fowler  wrote:

> Piranha (in my case 4:1 H2SO4 : 30%H2O2) boils at 160C. It is much more
> aggressive at this temperature. (also very dangerous!)
>
>
> ----- original message ----
> From: antwi nimo 
> To: [email protected], General MEMS discussion 
> Date: 06/23/2010 09:47 AM
> Subject: Re: [mems-talk] Removing hard-baked photoresist
>
>
> A mixture of H2SO4 and H2O2 at a temperature of  ~180celsius can remove
> the resist...This solution is used the remove resist when making glass
> mask...I am sure it can remove this resist to.....i hope this information
> helps,
> Nimo

*  Zou Jie (Jay)
*  Department of Physics
*  University of Florida
*  Tel: +1-352-846-8018
*  Email: [email protected]
*  Homepage: http://plaza.ufl.edu/zoujie/
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