A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Removing hard-baked photoresist
Removing hard-baked photoresist
2010-06-22
ameya g
2010-06-23
antwi nimo
2010-06-23
Jesse D Fowler
2010-06-24
Jie Zou
2010-06-24
Morrison, Richard H., Jr.
2010-06-25
[email protected]
2010-06-24
Mike Whitson
2010-06-24
Bill Moffat
2010-06-24
Michael D Martin
2010-06-25
ameya g
Removing hard-baked photoresist
[email protected]
2010-06-25
Hi there,

     At our lab, we boil Piranha at 120C.  As far as the time is concerned, the
thicker the resist and the denser pattern, the longer it takes.  At the
thickness of 15 microns and generally moderately dense, we usually give it
a good half an hour.   Anyway to ensure it removes all resist, you can
leave it a bit longer in Piranha.   When you see scum of photoresist on the
surface of Piranha solution, it usually means you need to add more H2O2.
When you do add H2O2, the resist scum will disappear because it reacts with
H2O2 and becomes gases.

Cheers,
Wutthinan


> Holy cow... are you sure this won't explode?
>
> Jie
>
> On Wed, Jun 23, 2010 at 1:26 PM, Jesse D Fowler 
wrote:
>
>> Piranha (in my case 4:1 H2SO4 : 30%H2O2) boils at 160C. It is much more
>> aggressive at this temperature. (also very dangerous!)
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMStaff Inc.
Harrick Plasma, Inc.
The Branford Group
Nano-Master, Inc.