A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: lithography fin etch to define silicon NW
lithography fin etch to define silicon NW
2010-08-03
Yu Chen
2010-08-03
Yingnan Wang
2010-08-03
Bill Moffat
2010-08-09
Jaibir sharma
2010-08-09
Marcel Spurny
lithography fin etch to define silicon NW
Bill Moffat
2010-08-03
If you are using a normal exposure to define a square the corners get
exposed from both sides and the corners start to disappear.  Controlled
over exposure can create a circle or close to it.  Bill Moffat.

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On
Behalf Of Yingnan Wang
Sent: Tuesday, August 03, 2010 7:03 AM
To: [email protected]
Subject: Re: [mems-talk] lithography fin etch to define silicon NW

Hi Chen,

I think you can round the corners by annealing the silicon NW in
hydrogen.

BR,

YN WANG
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
The Branford Group
MEMStaff Inc.
Harrick Plasma, Inc.
Tanner EDA by Mentor Graphics