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MEMSnet Home: MEMS-Talk: RIE chamber cleaning
RIE chamber cleaning
2010-09-30
Zetao MA
2010-09-30
Robert Ditizio
2010-09-30
Salam Gabran
2010-10-04
Jack Ma
RIE chamber cleaning
Salam Gabran
2010-09-30
Hi,

we use a 3 step clean recipe for the RIE:

1: Pressure 100, RIE 200W + ICP 200W: 45sccm O2 + 5sccm SF6 @ 10min
2: Pressure 100, RIE 200W + ICP 200W: 5sccm O2 + 45sccm SF6 @ 10min
3: Pressure 100, RIE 200W + ICP 200W: 45sccm O2 @ 10min

kind regards

Salam R. Gabran, MASc.
Research associate, PhD. Candidate
Center for Integrated RF Engineering
(CIRFE) Group
ECE Dept., University of Waterloo,
200 University Avenue West
Waterloo, Ontario, N2L3G1
cell.: 519-729-8066
Web: www.ece.uwaterloo.ca/~sgabran

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