Hi all,

i've read the interesting paper

"Fast wet anisotropic etching of silicon utilizing microwave treatment of
KOH etchant "

which describes etching of silicon in KOH using microwaves as heating
source. The main advantage is that etch rate increases considerably with
respect to heating by thermal sources.

Does anyone have any experience in KOH+microwaves etch for the realization
of silicon membranes ?

Best regards,
Andrea