ICP is RIE. Besides, XeF2 doesn't need plasma to work.

IOW, not sure where your train of thoughts is headed to.


m

On 1/8/11, [email protected]  wrote:
> RIE or ICP?
>
>
> ------Original Message------
> From: Paul Sunal 
> To: General MEMS discussion 
> ReplyTo: Paul Sunal 
> Re: [mems-talk] etch rate of Ag in XeF2
> Jan 7, 2011 20:06
>
> Tricia,
>
> It does!  But in a complex manner.  I don't have the etch rate, but I
> know from experience that the Ag undergoes some sort of chemical
> reaction and then etches away.  It is slower than the etch rate of
> silicon, but still fairly fast.
>
> Regards,
>
> Paul