Dear Dietrich,

when the spinner starts spinning, centrifugal forces take over and gravity
effect to keep the liquid with angel will not be possible. As the speed
increases, irrespective of angle of substrate, the coating will be very
uniform.

Nabhiraj


On Mon, Feb 28, 2011 at 7:07 PM, Dietrich Lueerssen <
[email protected]> wrote:

> Hi there,
>
> I have not tried this suggestion. However, it would seem to me that if you
> mounted the substrate at an angle to the axis of rotation of the spinner
> (rather than it being perpendicular), you might be able to achieve the
> difference in height of the photoresist. Now it would be up to you to try
> and achieve that in your spinner...
>
> Good luck,
> Dietrich