Senthil Nathan Sambandam wrote:
>
> Hi there,
>
> I am looking for etchants for titanium dioxide and few other oxides. Could
> anyone suggest a reference where these information would be available. I
> have alreday looked at etching tables in " Thin film processes" and "VLSI
> fabrication principles". Any help is appreciated.
>
> Senthil Nathan

Dear Senthil,

I found a reference about dry-etching of TiO2:

RIE in CF4 Plasma at 0.12 torr, 100 W, etch rate 1.5 nm/s
A. Matsutani et. al. in Japanese Journal of Applied Physics 30 (1991),
p.428

Best regards


Gerhard


--
Gerhard Lammel
Institut de microsystemes
Ecole Polytechnique Federale de Lausanne (EPFL)
CH-1015 Lausanne, Switzerland
tel: ++41 (0)21 693 65 73
fax: ++41 (0)21 693 59 50
email: [email protected]