I had a similar problem when using Omnicoat. I was recommended to triple
coat the Omnicoat and bake at 200C on a hotplate for 5 minutes and then
increase exposure dose by about 30%.
I never tried this advice but would be interested to know if it works. N.B.
do you get good adhesion on bare silicon without Omnicoat? I think Omnicoat
may only be useful as a release layer.


On 2 July 2013 21:16, Tong CHEN  wrote:

> Hello,
>
> dose anybody use SU-8 2050 to make 100um of thickness, I have totally
> adhesion failure when I deposit it on a Omnicoat(from Microchem too)surface
> on Si, when I do the development, the patterns can be removed by twizzer, I
> made up to 550mj/cm2 of exposure, and PEB 95C 12 min, it still didn't work.
> I don't know where the problem is.
>
> Thanks for your help
>
> --
> Tong Chen
> Postdoc
> SyntheCell Team
> IGDR CNRS UMR 6290
> 2, Avenue du Professeur Léon Bernard
> 35043 Rennes
> France
>
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