Dear MEMS companions,
the support for the web page on the SU-8 ultra-thick photoresist has been
very large, and I want to thank all the contributors, in chronological order
:-) :Beverley Eyre, Loren St. Clair, Hubert Lorenz, Marc Heuschkel, Padmaja
Ramadas, Arnaud Bertsch...
Thank you!
I hope people here will continue to send process details and results
(mechanical characterisation data, stripping recipe are welcome :-) for this
versatile new MEMS material, that may be used as a mask for patterning, as a
mould for electroplating or as a structural material! Hope the webpage could
help anyone here to fabricate new wonderful toys :-)
The updated page can be found at:
http://aveclafaux.freeservers.com/SU-8.html#top
Enjoy... and comment!

Franck