Dear James Cotsell,

You might wish to read the following paper:

        Uyehata, S.G. and E.S. Kolesar, Jr., "Micromachined Silicon Surfaces
for     Maximizing Optical Absorption at 632.8 nm," Journal of
Micromechanics and      Microengineering, Vol. 1, No. 3, pp. 171-181,
September 1991.

Best regards,

Ed Kolesar
____________________________________________________
Edward S. Kolesar, PhD, P.E., W.A. Moncrief Professor of Engineering
Texas Christian University
Department of Engineering
TCU Box 298640
Fort Worth, TX   76129

Telephone:  (817) 257-6226 (office & voice mail)
                      (817) 257-7126; -7677 (secretary)

Telefax:         (817) 257-7136

E-mail:           [email protected]

WWW:           http://www.engr.tcu.edu
_____________________________________________________________



> ----------
> From:         james cotsell
> Reply To:     james cotsell;[email protected]
> Sent:         Monday, February 15, 1999 10:44 PM
> To:   [email protected]
> Subject:      Pyramid formation
>
> Dear researchers,
>
> I am currently trying to form pyramids on silicon wafers for use in the
> manufacture of solar cells (texturing).  My process at the moment
> involves a dip in concentrated KOH followed by immersion in a 10% KOH
> solution containing isopropanol. While this works ocasionally It often
> doesn't and I was wondering if anyone can help me with making the
> methind more reliable.
>
> Any information on the anisotropic etching of silicon would also be
> appreciated, particularly on the chemistry of the whole procedure.
>
> Thanks in advance,
>
> James Cotsell
>
>