Hi Jung Hoon Yeom,

we find that plasma etching in O2 followed by an ultrasonic clean in acetone
and then IPA is good for generating hydrophilic surfaces.  An alternative is
to use pirhana (H2SO4:H2O2 4:1) followed by SC1 (H2O:H2O2:NH4OH 5:1:1)
cleaning.  We monitor the hydrophilicity using contact angle measurements.
Take a look at some work that we have done with IMEC in Belgium for more
information
http://www.nmrc.ie/projects/dissarm/Presentations_dissarm/JW_IEEE_EMBS.pdf

Helen.

Dr. Helen Berney.
National Microelectronics Research Centre, Lee Maltings,Cork, Ireland.
Tel +353-21-4904010 Fax +353-21-4270271 Email [email protected]


> Dear folks in the mems community
>
> I'd like to do conformal deposition on the Si substrate and modify it to
> hydrophillic surface(not hydrophobic) regardless of its thickness. And I
> am open to any kind of pocessing.
>
> Thanks
>
> Junghoon Yeom                   University of Illinois at Urbana-Champaign
> Research Assistant              Department of Mechanical & Industrial Engr
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