Hi ken,
try the ref. Hirohisa kikyuama,kiyonori saka,jun takano,ichiro
kawanabe,masayuki miyashita and tadahiro ohmi "principles of Wet Chemical
processing in ULSI microfabrication",IEEE trans. semi.
manufacturing,vol4,no.1,feb 1991.
regds,
ravi shankar
Semiconductor Complex ltd,
India.
Phone: 91-172-254401
Fax:91-172-253378


On Tue, 18 Dec 2001, Ken Kwon wrote:

> Hello,
>
>      I am looking for a literature or an article about effect of using
> ammonium flouride in oxide wet etching (BOE) and in isotropic silicon wet
> etching.  I know that it is acting as a buffer but I want to know about its
> mechanism and any experiment results showing why ammonium flouride is
> prefered in some cases.
>
> Thank you.
>
> Ken.
>
>
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