Dear All,

I am trying to electroplate gold on top of silica: for that I sputtered a
few nm Ti and then few nm of gold on top of the silica and place that in
the electroplating solution at 50C. I used a current of 50mA that will
give us around 2 micron thick layer of gold in 20min.

The surface appear with a lot of roughness.... Could somebody give me some
advice? Am I using the correct parameters for current and temperature to
get an uniform layer?

Thank you very much for your help!

Sonia.

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Sonia Garcia-Blanco

Department of Electronics and Electrical Engineering
University of Glasgow
Oakfield Ave.
G12 8LT
Glasgow

Phone:
   Office: (0141) 339 8855 ext 0101
   Lab:    (0141) 330 6014
Email: [email protected]

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