SiO2 would probably provide a better mask, but if you don't need to etch very
deep the nitride might suffice.  Better yet if you have resist on top of the
nitride as extra protection.  SF6 is an excellent etchant for Si using RIE.

Roger Shile

>>> [email protected] 03/07/02 09:33AM >>>
Hi,
I am going to etch silicon using silicon nitride as the mask. But I only
have CF4, SF6, O2 and He... I am not sure if those gases are enough for my
application or I need to order some new gases.
Thanks.

Peng Yao
DOEs lab
Electrical Engineering Dept.
Univeristy of delaware
Newark D.E 19716
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