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MEMSnet Home: MEMS-Talk: Using AZ300 PR developer to etch Al
Using AZ300 PR developer to etch Al
2002-03-13
Chan Ho Yin
Using AZ300 PR developer to etch Al
Chan Ho Yin
2002-03-13
Hi,


    According the suggestion from previuos post, I have tried to etch Al
using AZ300 developer. And using AZ5214 as a mask. I found that the pattern
is not good enough. Some of the pattern is etched by the developer. About
10%.  And all others are quite good.  What'w worng??  Can someone suggest
me how to mask my Al? Or what should I do to AZ5214 for a good protestion?

    Also, if I use ~1.6um AZ5214 to mask a layer (~2um) Al, is it possible
to etch Al thoroughly? Will the PR be etched competely before Al??

Thank You

Hoyin

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