Hi,

You may want to have a look at a comprehensive paper
"Etch rates for micromachining processing" that was
published on Jounal of Microelectromechanial systems,
Vol.5, No.4, 1996. You can download it from
IEEExplore.

Regards,
Ebin
--- "Venubabu.U"  wrote:
>  Dear MEMS coworkers,
>          Can someone tell me the etch rates of
> polycrystalline silicon,
>          positive photo resist and silicon
> dioxide.Iam using reactive ion
>          etching process,gasses are freon and
> oxygen.
>                                           thanks
>                                            venu babu
>                                            research
> scholar
>                                            IIT
> MADRAS,INDIA.
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