Guangqing,
As I mentioned before, this was over 20 years ago. I do not remember the
concentration or makeup of the EDTA etch. Maybe someone else has an idea. I
think the best answer is to etch the Ti:W with H2O2 in a Stainless-Steel
container.
Good Luck,
Charles.....
----- Original Message -----
From: "Guangqing Meng"
To:
Sent: Monday, May 20, 2002 4:48 PM
Subject: Re: [mems-talk] Wet etching TiW
> Dear Charles,
>
> Do you know if EDTA will attack photoresist or not? When you dip the
wafers
> into EDTA etchant, is the etchant commercially available or is it needed
to
> mix?
>
> Your reply will be highly appreciated.
>
> Guangqing
>
> -----Original Message-----
> From: Charles Ellis
> To: [email protected]
> Date: Thursday, April 25, 2002 7:58 AM
> Subject: Re: [mems-talk] Wet etching TiW
>
>
> Hello Anke,
>
> I seem to remember having this problem 22 years ago. After etching the
> Ti:W
> (in 30% H2O2 - stock solution), there would be a very slight residue.
> Many
> times we could only see it after passivation, but if you looked close
> enough
> you could detect it. If my memory serves me correctly, we dipped the
> wafers
> in an EDTA etchant (after the H2O2), the other thing that worked was to
> etch
> the Ti:W in 30% H2O2 in a Stainless-Steel tank. I know it sounds
strange,
> but we fond that just using the SS tank made a great difference. I
> remember
> we tried adding various Fe products in the Ti:W without much success. I
> hope this helps.
>
> Charles Ellis
> Auburn University...
>
> ----- Original Message -----
> From: "Anke Stock"
> To:
> Sent: Thursday, April 25, 2002 2:17 AM
> Subject: [mems-talk] Wet etching TiW
>
>
> > Hello to everybody,
> > is there someone who has experience in wet etching of TiW? I use a
> > mixture of HCl and H2O2, but it seems that there are small amounts of
> > TiW on the wafer after etching. Has someone experiences with
parameters
> > like temperature, time, other mixtures or something else? Many thanks
> > for your help
> > Anke
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