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MEMSnet Home: MEMS-Talk: Re: HF and photoresist mask
Re: HF and photoresist mask
2002-05-31
Jian Li
2002-05-31
Jing Liu
2002-05-31
Henry Yang
Re: HF and photoresist mask
Jing Liu
2002-05-31
Upon my experiment, Au has good adhesion with PR. and withstand HF for >30min.
But I may not be able to use metal at this time for other constraints.

Thanks for your info!

Jing

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