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MEMSnet Home: MEMS-Talk: plasma etching problem
plasma etching problem
2002-08-24
Ravi Shankar
2002-08-26
Philip Lau
2002-08-26
[email protected]
plasma etching problem
[email protected]
2002-08-26
Probably due to the etch rate difference between oxide and nitride. Depending
on your process you are probably undercutting the nitride at a rate at lease
2x the etch rate of the oxide. You can call if you want to discuss further.

Bob Henderson
Process Integration,LLC
480-558-1156

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