You can try to use a mild detergent at 2-5%
concetration with water.

Pedro Parracho
INESC-MN

Cópia Ken-Chao Chen :

> Hi,
>
> Learning from papers, to ease the process of
> peeling off PDMS, we should
>   expose the master, silicon wafer with pattern
> on its upper side, by
> alkyltrichlorosilane or RIE the master with
> trifluoromethane, before
> spining on PDMS. Is there any more convenient
> method to achieve the same
> effect, i.e., to reduce the adhesion between Si
> surface and PDMS?
>
> Thanks! Your opinion is highly appreciated!
>
> Sincerely,
>
> Ken-Chao, RA of IAM of NTU in Taiwan
>
>
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