A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: etching Si-N, but not Al2O3
etching Si-N, but not Al2O3
2002-10-22
Justin Borski
2002-10-22
[email protected]
2002-10-22
[email protected]
2002-10-22
Robert C Cole
etching Si-N, but not Al2O3
[email protected]
2002-10-22
A standard Fluorine plasma in an rie system should accomplish what you are
looking for without removal of Al2O3. If you want further information give me
a call at 480-558-1156

Bob Henderson


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Harrick Plasma, Inc.
Mentor Graphics Corporation
Tanner EDA by Mentor Graphics
Addison Engineering