Hi:

My institute is looking for a research type spectrophotometer (NOT
ellipsometer) to measure film thickness on various substrates (Glass, III-V,
Cu, Al or Silicon). I have used the Leitz MV-SP Spectrophotometer before and
hope to get a similar one. Below is the description for that system.

Spectrophotometer uses optical methods to obtain quick, non-destructive
thickness measurements of films from 10 nm to 15 µm thick. Measurement time
is from 20 to 60 seconds and accuracy is quoted as plus-minus 3%.
Measurements can be done inside geometries as small as four square
micrometers (4 µm by 1 µm). Software is provided for measuring silicon
dioxide, silicon nitride, polysilicon, polyimide, aluminum oxide, and
photoresist. These films may be measured on silicon, aluminum, or III-V
substrates. Programs are also provided for measuring the top layer of
multiple film structures. In addition, other films and substrates can be
added to the library.

Pls. let me know if you have the contact source for the similar system from
either Leitz or any other suppliers.


Best Regards,

Xiaosong Tang, Eric
Senior research officer
Institute of materials Research and Engineering
Singapore 117602
[email protected]
Tel: 65-68748077
Fax:65-67741042