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spin photoresist after releasing the structure (Yong Zhu)
ion implanter foundry service (Mounir.Ennabli@ibsen.dk)
Far IR emissivity of silicon and silicon nitride (Steve.S.Larson@pmusa.com)
spin photoresist after releasing the structure (Brubaker Chad)
Re: mems-talk digest, Vol 1 #55 - 5 msgs (Craig McGray)
young's modulus,compliance coeff, poission ratio ofSi in <110> direction (kirt_williams@agilent.com)
resistivity values of TaN and TiW (Adnan Merhaba)
Nanopowder Custom Synthesis (Cindi Prorok)
Fw: Re: Furnaces or Autoclave for Small Lab (Jiangang Du (John Duke))
RE: Gold Electroplating (Mark Shaw)
Re: electroplating gold (eddy)
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