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10 nm patterns (Parijat Bhatnagar)
SU8-developpement problems (Christoph Friese)
how to spincoat a 50nm thin uniform film of AZ9260? (Kirkness Jeoffrey)
MJB4 mask aligner lamp power and PMMA UV exposure (Kirkness Jeoffrey)
MJB4 mask aligner lamp power and PMMA UV exposure (Paul Maciel)
mems-talk] MJB4 mask aligner lamp power and PMMA UV exposure (Rob Hardman)
etch ZnO, not Al (Raegan Johnson)
etch ZnO, not Al (abong)
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