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  • Silicon etch low roughness (Chilcott, Dan - GS)
  • SiO2 RIE etching without carbonizing the photoresist (weiquan yang)
  • 50 nm resist (Michael Cooke)
  • SiO2 RIE etching without carbonizing the photoresist (Bob Henderson)
  • Silicon etch low roughness (Wendell McCulley)
  • SiO2 RIE etching without carbonizing the photoresist (Brad Cantos)
  • patterning sub-micron holes in chromium (Marc Reinig)
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