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Alex Usenko's Resume

Contact22 Indian Pipe
Painted Post, NY 14870
US
908 656 6700
usenko@yahoo.com
GoalPrincipal Scientist - Physics, Materials, Semiconductors
Skillswafer bonding, etching, deposition, epitaxy, implantation, annealing
Qualifications Alex Usenko
22 Indian Pipe, Painted Post, NY 14870 – (908)656-6700 – usenko@yahoo.com

Objective Principal Scientist –Physics, Materials, Semiconductors
Summary R&D professional. Innovator and workaholic with proven track of records – over hundred patents and publications, many new products launched. Ready to work for a Company that value commercializing revolutionary inventions to open new markets
Skills • Semiconductor Materials and Devices
• Silicon Process Technologies: wafer bonding, ion implantation, plasma and chemical etch, epitaxy, film deposition, oxidation, etc.
• Hands-on semiconductor processing in cleanroom facilities
• Layer transfer (smart-cut) technology – for silicon, GaN, SiC, Sapphire, etc.
• Glass and Ceramics
• Innovative thinking, use TRIZ (Theory for Inventive Problem Solving); inventor
• Prototype manufacturing
• Ability to work under pressure and deadlines, independently, take initiative and responsibility
• Securing government and venture capital funds for company R&D
Experience Research Associate
Corning, Inc., Corning, NY
2008 – 2012
• Discovered self-organizing process to make moth eye surface on glass – thus making glass non-glare, non-reflective, fingerprint repelling, antimicrobial, scratch resistant and self-cleaning
• Invented new process transforming glass into ceramics – useful, say, for making interposers – sheets on which semiconductor chips are assembled
• Suggested new concept to add self-cleaning and disinfecting functionality to faces of handheld devices (by photocatalysis)
• Invented silicon-on-glass layer transfer process – licensed by industry leader in Smart-Cut
Chief Scientist
MEC Tech, Toms River, NJ
2005 – 2008
• Lead development of new products as 450mm silicon focus rings for plasma equipment
Chief Technology Officer, Co-Founder
Silicon wafer Technologies, Newark, NJ
2000 – 2005
• Identified sources, prepared applications, and secured Company funding from Small Business Innovation Research (SBIR) and other government and state sources, about $2M total
• Invented improved layer transfer (smart-cut) process for making silicon-on-insulator wafers
• Covered Company product – silicon-on-insulator wafers – with numerical patents
• Prepared company business plan and presented to prospective investors
• Worked with Silicon Valley, Boston, and New York City venture capital firms to fund Company scale-up
Director, Silicon-on-Insulator Projects
New Jersey Microsystems, Newark, NJ
1997 – 2000
• Developed display for an universal communication device (under contact with CopyTele, like today’s iPhone)
• Invented system-on-chip process combining CMOS and MEMS
Education PostDoc
New Jersey Institute of Technology, Newark, NJ
1996
Micro-electro-mechanical systems (MEMS)
PhD
Moscow Technological University, Moscow, Russia
1986
Material Science, Physics
MSEE
Moscow Institute of Electronic Technology, Moscow, Russia
1980
Semiconductors, Electrical Engineering
Consulting • Transferred my expertise in layer transfer technology to Samsung-Corning Precision (Seoul, South Korea) to make initial substrates for light emitting diodes (LED)
• Technical and patent-related consulting though Gerson Lehrman Group, NEWN, etc. on semiconductor materials
• Consult New York venture capital firms as Carrot, etc. on semiconductor projects
• Referee for top professional journals as IEEE Transactions on Electronic Devices, IEEE Transactions on Nuclear Sciences, Semiconductor Science and Technology, Journal of Physics D, etc.
Teaching PhD thesis advisor. All my grad students at New Jersey Institute of Technology, and Moscow Technological University successfully graduated and landed good jobs.
Awards SBIR Phase I, II contracts from US Ballistic Missiles, Navy, Army, National Science Foundation, etc.
Research grants from Soros, NATO, Fulbright foundation, etc.
Publications 100+ papers including in top referred journals as Journal of Material Science, Japanese3 Journal of Applied Physics, Journal of electronic Materials, IEEE Transaction on Nanotechnology, etc.
20+ American patents (number rising), dozen Soviet patents, many International Patent Applications
References Please ask

Updated: 2012-12-11
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