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Hirotaka Sato's Resume

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Resume_Hirotaka Sato.pdf (752.9 KB, application/pdf): attached by hirosato (Hirotaka Sato) on 2010-03-25 12:33
Resume_Hirotaka Sato.pdf (485.2 KB, application/pdf): attached by rmasse (Roger Masse) on 2008-07-16 22:51

Contact	407 Cory Hall Berkeley, CA 94720 US 734-709-0144 [email protected]	Goal	MEMS developer, Electrochemist working on electroplating and electrochemical etching in micro/nano scale.
Contact		Skills	Nano, micro fabrication processes. Almost all wet, dry, lithography processes are included. For details, please see my resume.
Qualifications	Hirotaka SATO, Ph.D. Date of Birth :July 8, 1977 Nationality : Japan E-mail : [email protected] University of California, Berkeley, Electrical Engineering and Computer Science February 2008 – Present Postdoctoral Research Fellow University of Michigan, Electrical Engineering and Computer Science January 2007 – January 2008 Postdoctoral Research Fellow Waseda University, Tokyo, Japan, Applied Chemistry April 2004 – January 2007 Research Scientist Education Ph.D., Chemistry, Waseda University, Tokyo March 2005 Thesis title: “A Study on the Electrochemical Fabrication Processes for Three-dimensional Microstructures and Their Application to Functional Devices” won a prize, Mizuno Memorial Award for Outstanding Doctoral Thesis Master, Chemistry, Waseda University, Tokyo March 2002 Started electrochemical deposition and etching processes to form 3D micro/nano structures including Bachelor, Chemistry, Waseda University, Tokyo March 2000 Worked on electrochemical thin film fabrication for magnetic recording media. Developed nano film whose magnetic properties (coercivity, crystallinity) were gradually changed along the film thickness. Honors and Awards 1)Frontiers in Neuroscience, The most viewed paper since the journal was established 2)TIME Magazine, The 50 Best Inventions of 2009 3)MIT Technology Review, Top 10 emerging technologies 2009 (TR10) Biological Machines 4)Selected top technologies (Cyborg beetle display), Tech Museum, University of California, Berkeley. 5)UK-Japan Research Exchange Scholarship Nanotechnology Research Network Center, MEXT Japan, 2006. 6)Poster Session Award, 1st prize International Symposium on Electrochemical Processing of Tailored Materials, Oct., 2005. 7)Mizuno Memorial Award for Outstanding Doctoral Thesis Waseda University, 2005. 8)Best Presentation Award International Symposium on Electrochemical Micro and Nanosystem Technologies, Sep., 2004. 9)Poster Session Award, 2nd prize International Symposium on Materials Processing for Nanostructured Device, Sep., 2001. 10)Best Presentation Award Waseda and Keio Universities Applied Chemistry Workshop, August, 2002. Journal Publications (19 Journal Papers, all peer-reviewed) 1) H. Sato, T. Yamaguchi, T. Isobe, S. Shoji, T. Homma, “Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor-electrolyte interface”, Electrochem. Comm., accepted. 2) H. Sato, C. W. Berry, Y. Peeri, E. Baghoomian, B. E. Casey, G. Lavella, J. M. VandenBrooks, J. Harrison, M. M. Maharbiz, “Remote radio control of insect flight”, Front. Integr. Neurosci., 3, 1-11 (2009). The Most Viewed Article 2009 3) H. Sato, T. Yamaguchi, T. Isobe, T. Homma, S. Shoji, “Self-aligned formation of nano-holes to arrayed micro glass tubes”, Electrochimica Acta, 53, 200-204 (2007). 4) H. Sato, “Micro/nano fabrication processes based on electrochemical methods”, J. Nano Sci. Tech., 5, 65-68 (2007). Invited Paper 5) H. Sato, T. Homma, “Fabrication of magnetic nanodot arrays for patterned magnetic recording media”, J. Nanosci. Nanotech., 7, 225-231 (2007). Review Paper 6) H. Sato, T. Homma, “Fabrication of high-aspect-ratio arrayed structures using Si electrochemical etching”, Sci. Tech. of Adv. Mater., 7, 468-474 (2006). 7) H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji, “Picoliter volume glass tube array fabricated by Si electrochemical etching process”, Electrochim. Acta, 51, 844-848 (2005). 8) H. Sato, T. Homma, H. Kudo, T. Izumi, T. Osaka, S. Shoji, “Three-dimensional microfabrication process using Bi electrodeposition for a highly sensitive X-ray imaging sensor”, J. Electroanal. Chem., 584, 28-33 (2005). 9) H. Sato, T. Homma, K. Mori, T. Osaka, S. Shoji, “Electrochemical formation process of Si macropore and metal filling for high aspect ratio metal microstructure using single electrolyte system”, Electrochemistry, 73, 275-278 (2005). 10) H. Sato, Y. Ohinata, T. Homma, T. Osaka, “Preparation of composite metal nanoparticles by electroless-deposition process using microchannel type reactor”, J. Surf. Finish. Soc. Jpn., 55, 966-967 (2004). 11) H. Sato, H. Kobayashi, H. Kudo, T. Izumi, T. Homma, T. Osaka, S. Shoji, Y. Ishisaki, R. Fujimoto, K. Mitsuda, “Development of Bi electrodeposition process for fabricating microabsorber array for high sensitive X-ray imaging sensor”, Electrochemistry, 72, 424-426 (2004). 12) T. Homma, H. Sato, K. Mori, T. Osaka, S. Shoji, “Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution”, J. Phys. Chem. B, 109, 5724-5727 (2005). 13) T. Homma, H. Sato, H. Kobayashi, T. Arakawa, H. Kudo, T. Osaka, S. Shoji, Y. Ishisaki, T. Oshima, N. Iyomoto, R. Fujimoto, K. Mitsuda, “Sn electrodeposition process for fabricating microabsorber arrays for an X-ray microcalorimeter”, J. Electroanal. Chem., 559, 143-148 (2003). 14) T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, S. Shoji, T. Osaka, T. Homma, K. Mitsuda, N. Yamasaki, R. Fujimoto, N. Iyomoto, Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, T. Ohashi, Y. Kuroda, M. Onishi, M. Goto, F. Beppu, “Fabrication of multi-pixel TES microcalorimeters with an electrodeposited Sn absorber and Bi absorber”, Nucl. Instrum. Methods Phys. Res., Sect. A, 520, 456-459 (2004). 15) N. Honda, M. Inaba, T. Katagiri, S. Shoji, H. Sato, T. Homma, T. Osaka, M. Saito, J. Mizuno, Y. Wada, “High efficiency electrochemical immuno sensors using 3D comb electrodes”, Biosens. Bioelectron., 20, 2306-2309 (2005). 16) H. Kudo, T. Nakamura, T. Arakawa, S. Ohtsuka, T. Izumi, S. Shoji, H. Sato, H. Kobayashi, K. Mori, T. Homma, T. Osaka, K. Mitsuda, N. Y. Yamasaki, R. Fujimoto, N. Iyomoto, T. Oshima, K. Futamoto, Y. Takei, T. Ichitsubo, T. Fujimori, Y. Ishisaki, U. Morita, T. Koga, K. Sato, T. Ohashi, Y. Kuroda, M. Onishi, K. Otake, F. Beppu, “Prototype of the high sensitive X-ray microcalorimeter for X-ray imaging”, Sens. Actuators, A, 114, 171-175 (2004). 17) H. Kudo, T. Arakawa, S. Ohtsuka, T. Izumi, S. Shoji, H. Sato, H. Kobayashi, K. Mori, T. Homma, T. Osaka, N. Iyomoto, R. Fujimoto, K. Mitsuda, N. Y. Yamasaki, T. Oshima, K. Futamoto, Y. Takei, T. Ichitsubo, T. Fujimori, Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, T. Ohashi, Y. Kuroda, M. Onishi, K. Otake, F. Beppu, “High sensitive X-ray microcalorimeter using Bi-Au microabsorber for imaging applications”, Jpn. J. Appl. Phys., Part 1, 43, 1190-1195 (2004). 18) R. Fujimoto, K. Mitsuda, N. Y. Yamasaki, N. Iyomoto, T. Oshima, Y. Takei, K. Futamoto, T. Ichitsubo, T. Fujimori, K. Yoshida, Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, T. Ohashi, H. Kudo, H. Sato, T. Arakawa, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, S. Shoji, T. Osaka, T. Homma, Y. Kuroda, M. Onishi, M. Goto, F. Beppu, T. Tanaka, T. Morooka, S. Nakayama, K. Chinone, “TES microcalorimeter development for future Japanese X-ray astronomy missions”, Nucl. Instrum. Methods Phys. Res., Sect. A, 520, 431-434 (2004). 19) Y. Ishisaki, U. Morita, T. Koga, K. Shinozaki, K. Sato, N. Takai, T. Ohashi, T. Arakawa, H. Kudo, H. Sato, H. Kobayashi, T. Izumi, S. Ohtsuka, K. Mori, S. Shoji, T. Osaka, T. Homma, K. Mitsuda, N. Y. Yamasaki, R. Fujimoto, N. Iyomoto, T. Oshima, K. Futamoto, Y. Takei, T. Ichitsubo, T. Fujimori, K. Yoshida, Y. Kuroda, M. Onishi, M. Goto, F. Beppu, “Performance analyse's of TES microcalorimeters with mushroom shaped X-ray absorbers made of Sn or Bi”, Nucl. Instrum. Methods Phys. Res., Sect. A, 520, 452-455 (2004). Press Releases 1)MIT Technology Review, Top 10 emerging technologies (TR10) ‘Biological Machines’, March 2009. 2)New Scientist, ‘Free-flying cyborg insects steered from a distance’, October, 2009. 3)BBC NEWS, ‘Remote controlled bugs buzz off’, October, 2009. 4)Discover Magazine, ‘Beetle Borgs’, May 2009. 5)New Scientist, ‘The Cyborg Animal Spies Hatching in the Lab’, March, 2008. Patents 1)H. Sato, M. M. Maharbiz, C. W. Berry, B. E. Casey, G. Lavella, ‘Control system for insect flight’, WO/2009/088614. 2)T. Homma, S. Shoji, T. Osaka, H. Sato, “Microreactor and its fabrication process”, 2005-207901, Aug. 4, 2005. 3)N. Honda, S. Shoji, T. Homma, H. Sato, “Fabrication of micro-electrode and measurement of electrolyte with it”, 2004-93406, March 25, 2004. Book Chapters 1) H. Sato, D. Cohen, M. M. Maharbiz, “Building interfaces to developing cells and organisms: from cyborg beetles to synthetic biology,” in Integrated Microsystems: Mechanical, Photonic and Biological Interfaces, CRC Press (2010). 2)H. Sato, T. Homma, “Fabrication of Nanostructure”, Comprehensive Dictionary of Nanotechnology, Kogyo Chosakai Publishing Inc., 400-409 (2003). Presentations at International Conferences 1) Invited Talk “Cyborg Beetle: Remote radio control of insect flight”, CMOS Emerging Technologies, May, 2010. 2) Invited Talk “Remote radio control of insect flight”, International Symposium on Microchemistry and Microsystems (ISMM2009), November, 2009. 3) Invited Talk “Cyborg Beetle: Neural Stimulation for Insect Flight Control & Implanted BioFuel Cell”, BSAC Tokyo Technology Symposium, November, 2009. 4) Invited Talk “Remote radio control of insect flight“, BSAC Tokyo Technology Symposium, December, 2008. 5) Invited Talk “Development of electrochemical etching process for size-controllable pore-formation into Si wafer”, UK-Japan Collaboration Day, Sep., 2006. 6) Invited Talk “MEMS and Electrochemical Processing”, The 48th Material Tailoring Conference, July, 2006. 7) Talk / Late News “Flight control of 10 gram insects by implanted neural stimulators”, Hilton Head 2008, June, 2008. 8) Talk “A cyborg beetle: insect flight control through an implantable, tetherless microsystem”, MEMS 2008, Jan, 2008. 9) Talk “Electroless deposition process for synthesis of composite metal nanoparticles using micro-fluidic device”, The 5th Asian Conference on Electrochemistry, May, 2005. 10) Talk “Single Batch Process for Area-Selective Formation of Si Micropore Array and Metal Filling”, 206th The Electrochemical Society ,Oct., 2004. 11) Talk “Fabrication of microabsorber array for X-ray microcalorimeter by Sn electrodeposition”, The 200th The Electrochemical Society, Sep., 2001. 12) Poster / Late News “Three-dimensional tracking of microsystem-controlled free-flying insects”, Microtechnologies in Medicine and Biology (MMB), April, 2009. 13) Poster “Radio-controlled cyborg beetles: a radio-frequency system for insect neural flight control”, MEMS 2009, Jan., 2009. 14) Poster “Size-controllable formation of pore array into Si wafer using electrochemical etching”, The 57th International Society of Electrochemistry, Aug., 2006. 15) Poster “Formation process of micro-glass-tube array for fluid device based upon Si electrochemical etching and thermal oxidation”, The 4th International Symposium on Electrochemical Processing of Tailored Materials, Oct., 2005. 16) Poster “Three-dimensional electrodeposition process for fabrication of arrayed high sensitive X-ray microsensors”, The 56th International Society of Electrochemistry, Sep., 2005. 17) Poster “Formation of 256 pixels of X-ray microcalorimeters applying three-dimensional electrodeposition process for arrayed X-ray absorbers”, The 11th International Workshop on Low Temperature Detectors, Aug., 2005. 18) Poster “Development of a microreactor with nanovolume glass tube array fabricated by area-selective Si electrochemical etching process”, The 5th International Symposium on Electrochemical Micro and Nanosystem Technologies, Sep., 2004. 19) Poster “Fabrication of the array of high sensitive X-ray microdetectors by electrochemical micromachining process”, International Symposium on Materials Processing for Nanostructured Devices, May, 2003. 20) Poster “Modification of Si anodization process for area selective formation of high aspect ratio micropore array”, The 53rd International Society of Electrochemistry, Sep., 2002. 21) Poster “Application of Sn electrodeposition process to fabricate X-ray microcalorimeter”, International Symposium on Materials Processing for Nanostructured Devices, Sep., 2001. Professional Skills Preparation of nano/micro structured specimens (Wafer processing) Electrodeposition of various metals and alloys (Au, Ag, Co, Cu, Fe, Ni, Pd and etc.) Electroless-deposition of various metals and alloys (Au, Co, Cu, Ni, Pd and etc.) Electrochemical etching, electrochemical polishing and chemical etching of Si and various metals Photolithography system to form photoresist masks and molds RIE and D-RIE for deep etching of Si wafers Sputtering, evaporation and CVD to prepare thin films CMP (Chemical Mechanical Polishing)to flatten surfaces Manipulation and operation of specimens and micro-devices Micro sample-manipulator to inject liquid specimens into micro-channels and micro-tubes Flow control systems equipped with optical microscopes, CCD cameras and syringe pumps for micro-fluidic devices Potentiostat/Galvanostat systems and function generators to operate electrochemical detection devices Observation of specimens TEM and SEM to observe nano/micro-structures FIB to prepare cross-sections of specimens for SEM and TEM observation AFM and MFM to measure surface morphologies and magnetic states Evaluation and analysis of specimens VSM (Vibration Sample Magnetometer) to measure magnetic properties XRD to analyze crystal structures UV-Vis, IR, and Raman spectrometers to analyze molecular states in aqueous solutions EPMA (Electron Probe Micro-Analysis) for elemental analysis Simulation tool Coventor ware Full of passion Current Interests and Research Activities Electrodeposition, Electroless Deposition, Electrochemical Etching, Electrochemical Polishing, and Nanoparticles, MEMS, Nano/Micro-Fabrication Processes. Studied MEMS processes, by using electrochemical methods, for fabricating multi-pixels of X-ray micro-sensors, magnetic thin films, metal nanoparticles, high aspect ratio structures, and 3-D micro-electrode arrays. Developed processes for electrodeposition and electrochemical polishing of Sn and Bi to form X-ray micro-sensors applied to the X-ray imaging system to be loaded on the next projected space satellite. Investigated effects of electroless deposition conditions on magnetic properties of CoNiP thin films, resulting in successful control of coercivity Hc and saturated magnetization Ms of the CoNiP thin film by adjusting the diffusion rates of the metal ions. Synthesized composite metal nanoparticles by means of electroless deposition with micro-fluidic devices. Developed an electrochemical etching process of Si wafer to form high-aspect-ratio pore arrays, and applied them as the template for micro-glass-tube arrays and metal micro-needle arrays. Fabricated 3-D micro-electrode arrays for immunosensors by Ni and Cu electrodeposition and Au electroless deposition, and improved their fabrication conditions to obtain appropriate properties and smooth surfaces of the electrodeposited specimens.

Updated: 2010-03-25

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