Material: Silicon Nitride Hydrogen (SiNxHy), film

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Property↑↓	Value↑↓	Conditions↑↓	Reference↑↓
Refractive index	2.05	Thickness=0.11um,value measured by ellipsometry, n-type (100)oriented silicon wafers used as substrate,film deposited using r.f.plasma discharge from a gas mixture of SiH4,NH3,N2, substrate temp=293-400K,wavelength not given.	Thin Solid Films,216(1992), p.269