Material: Copper-Molybdenum (Cu-Mo), film

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Property↑↓	Value↑↓	Conditions↑↓	Reference↑↓
Coherently diffracting domains,CDD	1.4 .. 1.6 nm	Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=78%,Mo=22%.	Thin Solid Films,275(1996), p.26
Coherently diffracting domains,CDD	1.5 .. 1.7 nm	Metastable film,300 nm thickness=300nm, deposited by ion beam sputtering(IBS) method,on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=64%,Mo=36%.	Thin Solid Films 275(1996), p.26
Coherently diffracting domains,CDD	2.1 .. 2.3 nm	Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method, on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=50%,Mo=50%.	Thin Solid Films 275(1996), p.26
Micro-strains	0.002 .. 0.004	Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=78%,Mo=22%.	Thin Solid Films,275(1996), p.26
Micro-strains	0.018 .. 0.02	Metastable film,300 nm thickness=300nm, deposited by ion beam sputtering(IBS) method,on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=64%,Mo=36%.	Thin Solid Films 275(1996), p.26
Micro-strains	0.005 .. 0.007	Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method, on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=50%,Mo=50%.	Thin Solid Films 275(1996), p.26
Stress,in-plane	-4.7 .. -4.3 GPa	Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo .	Thin Solid Films,275(1996), p.26
Stress,shear	-340 .. -240 MPa	Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo .	Thin Solid Films,275(1996), p.26
Stress-free lattice parameter	0.3112 .. 0.3116 nm	Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo .	Thin Solid Films,275(1996), p.26