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| Property | Value | Conditions | Reference |
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| Coherently diffracting domains,CDD | 1.4 .. 1.6 nm | Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=78%,Mo=22%. | Thin Solid Films,275(1996), p.26 | | Coherently diffracting domains,CDD | 1.5 .. 1.7 nm | Metastable film,300 nm thickness=300nm, deposited by ion beam sputtering(IBS) method,on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=64%,Mo=36%. | Thin Solid Films 275(1996), p.26 | | Coherently diffracting domains,CDD | 2.1 .. 2.3 nm | Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method, on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=50%,Mo=50%. | Thin Solid Films 275(1996), p.26 | | Micro-strains | 0.002 .. 0.004 | Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=78%,Mo=22%. | Thin Solid Films,275(1996), p.26 | | Micro-strains | 0.018 .. 0.02 | Metastable film,300 nm thickness=300nm, deposited by ion beam sputtering(IBS) method,on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=64%,Mo=36%. | Thin Solid Films 275(1996), p.26 | | Micro-strains | 0.005 .. 0.007 | Metastable film,thickness=300nm,deposited by ion beam sputtering(IBS) method, on a quartz stripes with good flatness,values determined by X-ray diffraction method and W-A model,Cu=50%,Mo=50%. | Thin Solid Films 275(1996), p.26 | | Stress,in-plane | -4.7 .. -4.3 GPa | Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo . | Thin Solid Films,275(1996), p.26 | | Stress,shear | -340 .. -240 MPa | Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo . | Thin Solid Films,275(1996), p.26 | | Stress-free lattice parameter | 0.3112 .. 0.3116 nm | Thickness=300nm,deposited by ion beam assisted deposition method on a quartz stripes with good flatness, values are average and are determined by Dolle formalism and the rotational definition of strains for linear combination of pure Cu & Mo . | Thin Solid Films,275(1996), p.26 |
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