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Material: Molybdenum Silicide (MoSi2), film

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Property↑↓Value↑↓Conditions↑↓Reference↑↓
Hardness10 .. 12 GPaAmorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm.Thin Solid Films,214(1992), p.56
Hardness15 .. 22 GPaHot pressed,crystal structure:tetragonal,value obtained by nanoindentation method.Thin Solid Films,214(1992), p.56
Hardness8 .. 15 GPaliterature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method.Thin Solid Films,214(1992), p.56
Hardness10 .. 12 GPaReaction sintered,crystal structure:tetragonal,value obtained by Vickers indentation method.Thin Solid Films,214(1992), p.56
Young's Modulus225 .. 232 GPaAmorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm.Thin Solid Films,214(1992), p.56
Young's Modulus438 .. 463 GPaHot pressed,crystal structure:tetragonal,value obtained by nanoindentation method.Thin Solid Films,214(1992), p.56
Young's Modulus344 .. 439 GPaliterature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method.Thin Solid Films,214(1992), p.56
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