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| Property | Value | Conditions | Reference |
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| Hardness | 10 .. 12 GPa | Amorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm. | Thin Solid Films,214(1992), p.56 | | Hardness | 15 .. 22 GPa | Hot pressed,crystal structure:tetragonal,value obtained by nanoindentation method. | Thin Solid Films,214(1992), p.56 | | Hardness | 8 .. 15 GPa | literature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method. | Thin Solid Films,214(1992), p.56 | | Hardness | 10 .. 12 GPa | Reaction sintered,crystal structure:tetragonal,value obtained by Vickers indentation method. | Thin Solid Films,214(1992), p.56 | | Young's Modulus | 225 .. 232 GPa | Amorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm. | Thin Solid Films,214(1992), p.56 | | Young's Modulus | 438 .. 463 GPa | Hot pressed,crystal structure:tetragonal,value obtained by nanoindentation method. | Thin Solid Films,214(1992), p.56 | | Young's Modulus | 344 .. 439 GPa | literature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method. | Thin Solid Films,214(1992), p.56 |
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