Material: Niobium Oxide (Nb2O5), film

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Property↑↓	Value↑↓	Conditions↑↓	Reference↑↓
Density	4470 kg/m^3	Sputtered film,thickness=0.84 um, values are calculated using electrostatically deflectable me mbrans and Cr for metallization(thickness of 0.005um),assuming density of 7200kg/m/m/m & Young's Modulus of 180 GPa for Cr films.	IEEE Transactions on electron devices,Vol.ED25,No.10,Oct1978, p.1249
Young's Modulus	68 .. 102 GPa	Sputtered film,thickness=0.84 um, values are calculated using electrostatically deflectable me mbrans and Cr for metallization(thickness of 0.005um),assuming density of 7200kg/m/m/m & Young's Modulus of 180 GPa for Cr films.	IEEE Transactions on electron devices,Vol.ED25,No.10,Oct1978, p.1249