Dear Miaomin,
I am not sure where you are located. STS maintains a team of process
engineers to answer questions such as these. Please feel free to contact us
at any time with your questions. You can reach our PECVD process team at
bob.gunn@stsystems.co.uk or service@stsystems.co.uk
Best Regards
Andrew Tucker
Surface Technology Systems
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Message: 6
Date: Fri, 13 May 2005 10:35:38 +0800
From: "miaomin"
Subject: [mems-talk] black dots on SiN
To: "mems-talk@memsnet.org"
Message-ID: <200305130234.h4D2YJP02386@ime.pku.edu.cn>
Content-Type: text/plain; charset="GB2312"
dear colleagues
I have been working on a PECVD SiN 2000A dielectric directly on Au
layer (In a new STS PECVD equip.capactive coupled plasma, 8"
plates,temperature 300 centidegree ).However the film is full of uniformly
scattered black dots 1 micron or less (film extrusion under SEM )in
diameter. No such dots found on SiN on Silicon surface. Can anyone give me
some explain and/or improvement advise.
BTW,Need I deposite oxide before SiN deposition? can you give me a good way
to pattern the SiN without affecting the Au/Cr beneath? ThX in advance.
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¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡miaomin
¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡miaomin@ime.pku.edu.cn
¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡2005-05-13