First, I´d like to thank those who wrote me quoting used equipment for my lab.
We are reviewing the information to make a decision.

Now, we are experimenting with a microbeam, using an accelerator to go through a
silicon substrate with protons or heavy ions. Ions introduce damage across the
thickness of many materials, so that they can be selectively etched later. We
have information on this method using PMMA and other materials, but we were not
able to find literature using silicon.

Any article or data throwing light on this topic would be of great help. Thank
you very much.


Max Fischer